Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by S M Rossnagel, Jerome J Cuomo and William D Westwood.
By: Rossnagel, Stephen M.
Contributor(s): Cuomo, Jerome J | Westwood, William D.
Material type:
TextSeries: Materials science and process technology, NULL. Materials science and process technology, NULL.Publisher: New Jersey : Noyes Publications , 1989Description: xxiii,523p. : ills.,figs. ; 25cm `.ISBN: 0815512201.Subject(s): PLASMA ENGINEERING | SEMICONDUCTORS-ETCHING | PLASMA ETCHINGDDC classification: 621.044
| Item type | Current location | Call number | Copy number | Status | Date due | Barcode |
|---|---|---|---|---|---|---|
Text Book
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Central Library Reading Room (Library Annex) | 621.044 ROS/H (Browse shelf) | 1 | Not For Loan | 23973 |
Includes bibliographical references and index
23973 USD 86.00
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