Studies on high-k gate dielectrics on strained-si for heterostructure MOSFET applications / researched by Milan Kumar Bera; guided by Satyajit Saha and Chinmay K. Maiti.
By: Bera, Milan Kumar.
Contributor(s): Saha, Satyajit | Maiti, Chinmay K | Vidyasagar University. Department of Physics.
Material type: TextPublisher: Midnapore : Vidyasagar University, 2006Description: xviii,188p.+ 4 : figs.,tables ; 25cm.Subject(s): SEMICONDUCTORS | DIELECTRICS | METAL-OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR (MOSFTE)DDC classification: 537.622Item type | Current location | Collection | Call number | Copy number | Status | Date due | Barcode |
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Thesis | Central Library Reading Room (Library Annex) | Reference | 537.622 BER/S (Browse shelf) | 1 | Not For Loan | R230 |
Documents represents Ph.D Thesis
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